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DC Field | Value | Language |
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dc.contributor.author | Sahoo, Pratap Kumar | - |
dc.date.accessioned | 2025-04-03T10:08:51Z | - |
dc.date.available | 2025-04-03T10:08:51Z | - |
dc.date.issued | 2014-04-26 | - |
dc.identifier.citation | Basu, T., Kumar, M., Sahoo, P. K., Kanjilal, A., & Som, T. (2014). Tunable antireflection from conformal Al-doped ZnO films on nanofaceted Si templates. Nanoscale Research Letters, 9(1), 192. | en_US |
dc.identifier.uri | https://doi.org/10.1186/1556-276X-9-192 | - |
dc.identifier.uri | http://idr.niser.ac.in:8080/jspui/handle/123456789/1264 | - |
dc.description.abstract | Photon harvesting by reducing reflection loss is the basis of photovoltaic devices. Here, we show the efficacy of Al-doped ZnO (AZO) overlayer on ion beam-synthesized nanofaceted silicon for suppressing reflection loss. In particular, we demonstrate thickness-dependent tunable antireflection (AR) from conformally grown AZO layer, showing a systematic shift in the reflection minima from ultraviolet to visible to near-infrared ranges with increasing thickness. Tunable AR property is understood in light of depth-dependent refractive index of nanofaceted silicon and AZO overlayer. This improved AR property significantly increases the fill factor of such textured heterostructures, which reaches its maximum for 60-nm AZO compared to the ones based on planar silicon. This thickness matches with the one that shows the maximum reduction in surface reflectance. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Nanoscale Research Letters | en_US |
dc.subject | Ion beam-induced nanopatterning | en_US |
dc.subject | Silicon | en_US |
dc.subject | Aluminum-doped zinc oxide | en_US |
dc.subject | Sputter deposition | en_US |
dc.subject | Antireflection property | en_US |
dc.title | Tunable antireflection from conformal Al-doped ZnO films on nanofaceted Si templates | en_US |
dc.type | Article | en_US |
Appears in Collections: | Journal Papers |
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