Please use this identifier to cite or link to this item: http://idr.niser.ac.in:8080/jspui/handle/123456789/1264
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dc.contributor.authorSahoo, Pratap Kumar-
dc.date.accessioned2025-04-03T10:08:51Z-
dc.date.available2025-04-03T10:08:51Z-
dc.date.issued2014-04-26-
dc.identifier.citationBasu, T., Kumar, M., Sahoo, P. K., Kanjilal, A., & Som, T. (2014). Tunable antireflection from conformal Al-doped ZnO films on nanofaceted Si templates. Nanoscale Research Letters, 9(1), 192.en_US
dc.identifier.urihttps://doi.org/10.1186/1556-276X-9-192-
dc.identifier.urihttp://idr.niser.ac.in:8080/jspui/handle/123456789/1264-
dc.description.abstractPhoton harvesting by reducing reflection loss is the basis of photovoltaic devices. Here, we show the efficacy of Al-doped ZnO (AZO) overlayer on ion beam-synthesized nanofaceted silicon for suppressing reflection loss. In particular, we demonstrate thickness-dependent tunable antireflection (AR) from conformally grown AZO layer, showing a systematic shift in the reflection minima from ultraviolet to visible to near-infrared ranges with increasing thickness. Tunable AR property is understood in light of depth-dependent refractive index of nanofaceted silicon and AZO overlayer. This improved AR property significantly increases the fill factor of such textured heterostructures, which reaches its maximum for 60-nm AZO compared to the ones based on planar silicon. This thickness matches with the one that shows the maximum reduction in surface reflectance.en_US
dc.language.isoenen_US
dc.publisherNanoscale Research Lettersen_US
dc.subjectIon beam-induced nanopatterningen_US
dc.subjectSiliconen_US
dc.subjectAluminum-doped zinc oxideen_US
dc.subjectSputter depositionen_US
dc.subjectAntireflection propertyen_US
dc.titleTunable antireflection from conformal Al-doped ZnO films on nanofaceted Si templatesen_US
dc.typeArticleen_US
Appears in Collections:Journal Papers

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